laser annealing processes in semiconductor technology

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Laser Annealing Processes in Semiconductor Technology
Author : Fuccio Cristiano,Antonino La Magna
Publisher : Woodhead Publishing
Release Date : 2021-04-30
ISBN 10 : 0128202564
Pages : 426 pages
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Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Laser Annealing of Semiconductors
Author : J Poate
Publisher : Elsevier
Release Date : 2012-12-02
ISBN 10 : 0323145426
Pages : 576 pages
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Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

Scientific and Technical Aerospace Reports
Author : N.A
Publisher : N.A
Release Date : 1982
ISBN 10 :
Pages : 329 pages
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Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.

Rapid Thermal Processing and beyond: Applications in Semiconductor Processing
Author : Wielfried Lerch,Jürgen Niess
Publisher : Trans Tech Publications Ltd
Release Date : 2008-03-24
ISBN 10 : 3038131733
Pages : 448 pages
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Heat-treatment and thermal annealing are very common processing steps which have been employed during semiconductor manufacturing right from the beginning of integrated circuit technology. In order to minimize undesired diffusion, and other thermal budget-dependent effects, the trend has been to reduce the annealing time sharply by switching from standard furnace batch-processing (involving several hours or even days), to rapid thermal processing involving soaking times of just a few seconds. This transition from thermal equilibrium, to highly non-equilibrium, processing was very challenging and is still a field ripe for further development.

Lasers as Reactants and Probes in Chemistry
Author : William M. Jackson,Albert B. Harvey
Publisher : N.A
Release Date : 1985
ISBN 10 :
Pages : 533 pages
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Electron Technology
Author : N.A
Publisher : N.A
Release Date : 1997
ISBN 10 :
Pages : 329 pages
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Gallium Arsenide
Author : N.A
Publisher : N.A
Release Date : 1987
ISBN 10 :
Pages : 366 pages
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Semiconductor Technologies
Author : N.A
Publisher : N.A
Release Date : 1982
ISBN 10 :
Pages : 329 pages
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Nanoscience and Technology
Author : Chun Li Bai,Si Shen Xie,Xing Zhu
Publisher : Trans Tech Publications Ltd
Release Date : 2007-03-15
ISBN 10 : 3038131385
Pages : 1600 pages
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Volume is indexed by Thomson Reuters CPCI-S (WoS). Nanotechnology has been a priority research field in many countries, because new discoveries in this field have the potential power to unravel new phenomena and new principles of materials use. This collection of knowledge concerning frontier issues in nanotechnology will aid the further promotion of the integration of nanotechnology and industry.

Electronic Design
Author : N.A
Publisher : N.A
Release Date : 1979
ISBN 10 :
Pages : 329 pages
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Japanese Journal of Applied Physics
Author : N.A
Publisher : N.A
Release Date : 2007
ISBN 10 :
Pages : 329 pages
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Report of Research Center of Ion Beam Technology, Hosei University
Author : N.A
Publisher : N.A
Release Date : 1980*
ISBN 10 :
Pages : 329 pages
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