handbook of deposition technologies for films and coatings

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Handbook of Deposition Technologies for Films and Coatings
Author : Peter M. Martin
Publisher : William Andrew
Release Date : 2009-12-01
ISBN 10 : 0815520328
Pages : 936 pages
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This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

Handbook of Deposition Technologies for Films and Coatings
Author : Peter M. Martin
Publisher : William Andrew Pub
Release Date : 2009
ISBN 10 : 9780815520313
Pages : 912 pages
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Recent years have seen a rapid expansion in the applications of advanced thin film coatings in areas including photovoltaics, energy conversion, energy efficiency, biomedical engineering, telecommunications, pharmaceuticals and flat panel displays. In a tough economic climate, surface engineering remains a growth industry, because surface engineered products improve performance, increase energy efficiency, add functionality and reduce costs. This fully updated edition of Handbook of Deposition Technologies for Films and Coatings explores these new applications, and the major advances in deposition processes and technologies that have made them possible. The aim of this handbook is to provide scientists and engineers with detailed and practical information on: Deposition processes for thin film coatings Surface engineering Advanced thin film applications and structures Relationships between deposition process parameters and thin film microstructure Nucleation and thin film growth processes Sculpted thin films Characterization of composition, bonding, and microstructure The role of plasmas in thin film growth In this third edition, extensive new material has been added throughout the book, especially in the areas concerned with plasma assisted vapor deposition processes and metallurgical coating applications. Peter M. Martin gained his PhD in Solid State Physics from Ohio State University and was a Post Doctoral Fellow at Carnegie-Mellon University. Dr Martin has been instrumental in developing patterned optical coatings for optical filtering, microwave shielding, and non-linear optical applications. - Explains in depth the many recent improvements in deposition technologies and applications - Thoroughly explains deposition technologies and their current applications - Discusses the numerous 'frontier areas' for the applications of the products of deposition technology

Handbook of Deposition Technologies for Films and Coatings
Author : Rointan Framroze Bunshah
Publisher : William Andrew
Release Date : 1994
ISBN 10 : 0815513372
Pages : 861 pages
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This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Handbook of Deposition Technologies for Films and Coatings
Author : Rointan F. Bunshah
Publisher : William Andrew
Release Date : 1994-12-31
ISBN 10 : 0815517467
Pages : 887 pages
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This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Deposition Technologies for Films and Coatings
Author : Rointan Framroze Bunshah
Publisher : William Andrew
Release Date : 1982
ISBN 10 :
Pages : 585 pages
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Handbook of Thin Film Technology
Author : Hartmut Frey,Hamid R. Khan
Publisher : Springer Science & Business Media
Release Date : 2015-05-06
ISBN 10 : 3642054307
Pages : 380 pages
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“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Handbook of Physical Vapor Deposition (PVD) Processing
Author : D. M. Mattox
Publisher : Cambridge University Press
Release Date : 2014-09-19
ISBN 10 : 9780080946580
Pages : 944 pages
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This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon
Author : Krishna Seshan
Publisher : CRC Press
Release Date : 2002-02-01
ISBN 10 : 9780815514428
Pages : 72 pages
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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Handbook of Sputter Deposition Technology
Author : Kiyotaka Wasa,Isaku Kanno,Hidetoshi Kotera
Publisher : William Andrew
Release Date : 2012
ISBN 10 : 1437734839
Pages : 644 pages
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Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

Handbook of Hard Coatings
Author : Rointan F. Bunshah,Christian Weissmantel
Publisher : Cambridge University Press
Release Date : 2001
ISBN 10 : 9780815514381
Pages : 550 pages
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Written by 12 leading experts, this is an essential resource for fabrication, characterization and applications in the field of hard coatings and wear resistant surfaces. Offering complete explanations of commercially oriented deposition technology, from traditional vacuum. Includes a detailed introduction to the science of characterizing and measuring hard coatings.

The Foundations of Vacuum Coating Technology
Author : Donald M. Mattox
Publisher : Springer Science & Business Media
Release Date : 2004-04-26
ISBN 10 : 9783540204107
Pages : 150 pages
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The Foundations of Vacuum Coating Technology is a concise review of the developments that have led to the wide variety of applications of this technology. This book is a must for materials scientists and engineers working with vacuum coating in the invention of new technologies or applications in all industries. With over 370 references, this is an excellent starting point for those who don’t want to reinvent the wheel. In particular, the book is a valuable reference for those interested in researching proposed or existing patents. This unique book provides a starting point for more in-depth surveys of past and recent work in all aspects of vacuum coating. The author uses his extensive knowledge of the subject to draw comparisons and place the information into the proper context. This is particularly important for the patent literature where the terminology does not always match industry jargon. A section of acronyms for vacuum coating and glossary of terms at the end of the book are critical additions to the information every reader needs.

Modern Technologies for Creating the Thin-film Systems and Coatings
Author : Nikolay Nikitenkov
Publisher : BoD – Books on Demand
Release Date : 2017-03-08
ISBN 10 : 953513003X
Pages : 444 pages
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Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all industries. The 20 chapters of this book present the achievements of thin-film technology in many areas mentioned above but more than any other in medicine and biology and energy saving and energy efficiency.