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Electron Beam Welding
Author : H Schultz
Publisher : Elsevier
Release Date : 1994-01-01
ISBN 10 : 1845698789
Pages : 240 pages
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Translated from the German, this is a practical book for engineers which explains the trials, development and manufacturing processes involved in electron beam welding.

The History of Electron-beam Technology
Author : Rointan F. Bunshah
Publisher : N.A
Release Date : 1961
ISBN 10 :
Pages : 30 pages
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Electron Beam Pasteurization and Complementary Food Processing Technologies
Author : Suresh Pillai,Shima Shayanfar
Publisher : Elsevier
Release Date : 2014-11-28
ISBN 10 : 1782421084
Pages : 352 pages
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Food safety is a constant challenge for the food industry, and food irradiation technology has developed significantly since its introduction, moving from isotope irradiation to the use of electron beam technology. Electron Beam Pasteurization and Complementary Food Processing Technologies explores the application of electron beam pasteurization in conjunction with other food processing technologies to improve the safety and quality of food. Part one provides an overview of the issues surrounding electron beam pasteurization in food processing. Part two looks at different thermal and non-thermal food processing technologies that complement irradiation. Finally, a case study section on the commercial applications of e-beam processing provides examples from industry.

Electron-beam Sources and Charged-particle Optics
Author : Eric Munro,Henry P. Freund
Publisher : N.A
Release Date : 1995
ISBN 10 :
Pages : 536 pages
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Electron Beam Technology
Author : Siegfried Schiller,Ullrich Heisig,Siegfried Panzer
Publisher : John Wiley & Sons
Release Date : 1982
ISBN 10 :
Pages : 508 pages
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Introduction to Electron Beam Technology
Author : Robert A. Bakish
Publisher : N.A
Release Date : 1962
ISBN 10 :
Pages : 452 pages
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Diode Compression of a High Current Relativistic Electron Beam with an Externally Driven Axial Current
Author : Michael E. Read
Publisher : N.A
Release Date : 1976
ISBN 10 :
Pages : 290 pages
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Instabilities of Relativistic Electron Beam in Plasma
Author : Valeriĭ Borisovich Krasovit︠s︡kiĭ
Publisher : Nova Publishers
Release Date : 2008
ISBN 10 : 9781600215155
Pages : 219 pages
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This book is devoted to the non-linear theory of the collective interaction between a modulated beam of relativistic charged particles and narrow electromagnetic and Langmuir wave packets in plasma or gas slow-wave systems. Regular oscillations excited by a relativistic beam under the conditions of Cherenkov resonance and the anomalous Doppler effect can be used to generate coherent microwave radiation and accelerate charged particles in plasma.

Electron-Beam Technology in Microelectronic Fabrication
Author : George Brewer
Publisher : Elsevier
Release Date : 2012-12-02
ISBN 10 : 0323153410
Pages : 376 pages
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Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

Electron-Beam Interactions with Solids
Author : Maurizio Dapor
Publisher : Springer
Release Date : 2003-07-03
ISBN 10 : 3540365079
Pages : 110 pages
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The interaction of an electron beam with a solid target has been studied since the early part of the past century. Since 1960, the electron–solid interaction hasbecomethesubjectofanumberofinvestigators’workowingtoitsfun- mental role in scanning electron microscopy, in electron-probe microanalysis, in Auger electron spectroscopy, in electron-beam lithography and in radiation damage. The interaction of an electron beam with a solid target has often been investigated theoretically by using the Monte Carlo method, a nume- cal procedure involving random numbers that is able to solve mathematical problems. This method is very useful for the study of electron penetration in matter. The probabilistic laws of the interaction of an individual electron with the atoms constituting the target are well known. Consequently, it is possible to compute the macroscopic characteristics of interaction processes by simulating a large number of real trajectories, and then averaging them. The aim of this book is to study the probabilistic laws of the interaction of individual electrons with atoms (elastic and inelastic cross-sections); to - vestigate selected aspects of electron interaction with matter (backscattering coe?cients for bulk targets, absorption, backscattering and transmission for both supported and unsupported thin ?lms, implantation pro?les, seconda- electron emission, and so on); and to introduce the Monte Carlo method and its applications to compute the macroscopic characteristics of the inter- tion processes mentioned above. The book compares theory, computational simulations and experimental data in order to o?er a more global vision.

Clinical Applications of the Electron Beam
Author : Norah Duv Tapley
Publisher : Krieger Publishing Company
Release Date : 1982
ISBN 10 :
Pages : 274 pages
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There has been an explosion in the knowledge, techniques, and clinical application of radiology in all of its specialities. This book describes the uses of the high-energy electron beam in the treatment of cancer. The author uses actual clinical histories and documents, including photographs.

The Continuous Electron Beam Accelerator Facility: Project Status and Physics, August 1989
Author : Hermann A. Grunder
Publisher : N.A
Release Date : 1989
ISBN 10 :
Pages : 329 pages
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